|
Patent |
Date |
Assignee |
Title |
|
US5500532 |
3/19/1996 |
Arizona Board Of Regents |
Personal Electronic Dosimeter |
|
US4610748 |
9/9/1986 |
Advanced Semiconductor Materials Of America, Inc. |
Apparatus For Processing Semiconductor Wafers Or The Like |
|
US5314772 |
5/24/1994 |
Arizona Board Of Regents |
High Resolution, Multi-Layer Resist For Microlithography And Method
Therefor |
|
US4874464 |
10/17/1989 |
Epsilon Limited Partnership |
Process For Epitaxial Deposition Of Silicon |
|
US4799451 |
1/24/1989 |
ASM America, Inc. |
Electrode Boat Apparatus For Processing Semiconductor Wafers Or The Like |
|
US4798165 |
1/17/1989 |
Epsilon |
Apparatus For Chemical Vapor Deposition Using An Axially Symmetric Gas
Flow |
|
US4789771 |
12/6/1988 |
Epsilon Limited Partnership |
Method And Apparatus For Substrate Heating In An Axially Symmetric
Epitaxial Deposition Apparatus |
|
US4744712 |
5/17/1988 |
None |
Apparatus And Method For An Improved Wafer Handling System For
Cantilever Type Diffusion Tubes |
|
US4744550 |
5/17/1988 |
ASM America, Inc. |
Vacuum Wafer Expander Apparatus |
|
US4669599 |
6/2/1987 |
Advanced Semiconductor Materials FICO Tooling, B.V. |
Apparatus And Method For Handling A Workpiece |
|
US4654509 |
3/31/1987 |
Epsilon Limited Partnership |
Method And Apparatus For Substrate Heating In An Axially Symmetric
Epitaxial Deposition Apparatus |
|
US4633051 |
12/30/1986 |
Advanced Semiconductor Materials America, Inc. |
Stable Conductive Elements For Direct Exposure To Reactive Environments |
|
US4610748 |
9/9/1986 |
Advanced Semiconductor Materials Of America, Inc. |
Apparatus For Processing Semiconductor |